Close

Presentation

A2-ILT: GPU Accelerated ILT with Spatial Attention Mechanism
TimeThursday, July 14th11:15am - 11:37am PDT
Location3007, Level 3
Event Type
Research Manuscript
Keywords
Physical Design and Verification, Lithography and DFM
Topics
EDA
DescriptionInverse lithography technology (ILT) is one of the promising resolution enhancement techniques (RETs) in modern design-for-manufacturing closure, however, it suffers from huge computational overhead and mask writing time. In this paper, we propose A2-ILT, a GPU accelerated ILT framework with spatial attention mechanism. We speedup the conventional gradient-based ILT flow with GPU and improve the quality by introducing spatial attention map, whose adaptability is further strengthened by Reinforcement-Learning deployment. Experimental results show that, comparing to the state-of-the-art solutions, A2-ILT achieves 5.06% and 11.60% reduction in printing error and process variation band with a lower mask complexity and superior runtime performance.